NDIR SiF4 Gas Sensor

Gasboard-2060 is a high-performance SiF4 gas sensor designed for real-time semiconductor chamber cleaning endpoint detection (EPD) in silicon-based CVD deposition chambers. Based on Non-Dispersive Infrared (NDIR) technology with a specially designed gas chamber, it provides highly selective and precise SiF4 concentration measurement in semiconductor chamber cleaning processes.

Features of NDIR SiF4 Gas Sensor

NDIR technology for high sensitive and accurate SiF4 measurement
Fast response for precise deposition chamber cleaning endpoint determination
Low zero drift and high repeatibility for consistent measurement performance
Modular design for easy system integration
Analog and digital communication outputs

Specification of NDIR SiF4 Gas Sensor

Measurement ¹	SiF4
Detection Principle	NDIR
Range^{2 3 4}	(0.0-0.2) Absorbance
Response Time ⁵	T90＜2s
Data Reporting Rate	0.5s
Analog Output	1-10VDC
Power Input	15VDC (≤300mA), 24VDC
Digital Communication	RS232
Sampling Port	KF16
Dimensions	200×120×75.5mm
Leak Rate	＜1×10-8 Pa·m3/s (He)
Operating Temperature	(5～65) ℃

1. All data in the table were measured under standard atmospheric pressure.

2. Measurement calibration gases were provided by a unit certified by the national metrology authority. All gases were diluted in dry nitrogen with a purity of ≥ 99.999%.

3. The above performance specifications were determined after calibration. All sensors were 100% calibrated during production.

4. Measurements were performed at 25 °C ambient temperature.

5. Measured at a flow rate of 5L/min.